Abstract
The consequences of the use of high-k dielectrics in nanocrystal based
non-volatile flash memories focusing on the electrical and electronic
properties are investigated through computational simulations. In the
light of these results, we discuss several aspects which must be
addressed for the design of such devices. We focus on nanocrystals flash
memories with HfO2 and SiO2 for analysis. Due to significant reductions
of the the single-electron tunneling time and improvements on the data
retention, high-k dielectrics offers important improvements for the
non-volatile flash memories technology.
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