Article,
ANODIC NIOBIUM PENTOXIDE FILMS - GROWTH AND THICKNESS DETERMINATION BY INSITU OPTOELECTROCHEMICAL MEASUREMENTS
ELECTROCHIMICA ACTA, 36 (8): 1297-1300 (1991)
DOI: 10.1016/0013-4686(91)80008-V
Abstract
Data on optical reflectance and anodization voltage, obtained during the
galvanostatic anodization of metallic niobium foils in an H3PO4(1%)
solution at room temperature were simultaneously recorded as a function
of time, to determine the thickness of the Nb2O5 films formed. From
these data, plots of film thickness vs anodization voltage were
obtained. A linear relation was always observed and in all cases but
one, an angular coefficient of 22 angstrom V-1 was verified.
